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This Standard provides a means for independent manufacturers to produce equipment and/or hosts which can be connected without requiring specific knowledge of each other
Recommendations given in this Document are intended for the definition and conformance of XML based standards
where applicable
トップカセットIDタグ領域（オプション） （1）
The interface specification in this Document is driven by and intended to mate with a carrier compliant to the relevant SEMI 450 mm FOSB Standard
P02900 - SEMI P29 - 減衰型位相シフトマスク（ハーフトーン型位相シフトマスク）およびマスクブランクスに特有な特性の仕様 Revision:SEMI P29-1105 - Superseded This Standard provides a meansglobal Micropatterning Committee200598global Audits and Reviews Subcommittee200510www. semi. org200511CD ROM19979 2005 Referenced SEMI Standards SEMI P1 Specification for Hard Surface Photomask Substrates SEMI P22 Guideline for Photomask Defect Classification and Size Definition
